• The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD)...
    6 KB (720 words) - 14:27, 26 August 2024
  • Technicolor SA since 1986 RCA clean, for silicon wafers RCA Camden RCA/Jive Label Group RCA Records RCA Red Seal Records RCA Studio B, a recording studio...
    2 KB (278 words) - 04:54, 11 August 2024
  • Thumbnail for Piranha solution
    Piranha solution (redirect from SPM clean)
    (H2S2O8) Peroxymonosulfuric acid, or Caro's acid (H2SO5) RCA clean (silicon wafer cleaning procedure) Chromic acid (H2CrO4) Superhydrophilicity Ultrahydrophobicity...
    20 KB (2,214 words) - 21:32, 28 September 2024
  • Thumbnail for Wafer (electronics)
    wafer contains no contamination. One of the most effective methods is the RCA clean. When used for solar cells, the wafers are textured to create a rough...
    37 KB (4,046 words) - 11:24, 11 September 2024
  • Thumbnail for RCA
    The RCA Corporation was a major American electronics company, which was founded in 1919 as the Radio Corporation of America. It was initially a patent...
    79 KB (9,528 words) - 17:31, 2 October 2024
  • overburden with an oxide on the active area. Etching (microfabrication) RCA clean Mahadevaiyer Krishnan, Jakub W. Nalaskowsk, and Lee M. Cook, "Chemical...
    9 KB (1,330 words) - 15:35, 19 September 2024
  • surface, they are usually removed by wet chemical treatment, e.g. the RCA clean procedure based on solutions containing hydrogen peroxide. Other solutions...
    58 KB (6,445 words) - 02:12, 12 September 2024
  • Thumbnail for Etching (microfabrication)
    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France...
    17 KB (1,558 words) - 09:49, 28 May 2024
  • Thumbnail for Semiconductor device fabrication
    Wet cleans Cleaning by solvents such as acetone, trichloroethylene or ultrapure water sometimes while spinning the wafer Piranha solution RCA clean Wafer...
    110 KB (11,590 words) - 03:26, 29 September 2024
  • alternating voltage. The wafer pairs pass the following process flow: RCA cleaning Surface activation at atmospheric pressure Treatment duration ~ 40 s...
    12 KB (1,399 words) - 22:10, 29 January 2021