• Thumbnail for SU-8 photoresist
    SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the...
    14 KB (1,718 words) - 12:28, 6 September 2024
  • Thumbnail for Photoresist
    issue for high-resolution patterning Example: SU-8 (epoxy-based polymer), good adhesion), Kodak Photoresist (KPR) Modulation transfer function MTF (modulation...
    29 KB (3,241 words) - 09:30, 11 August 2024
  • Thumbnail for LIGA
    ultraviolet light source, like a mercury lamp, to expose a polymer photoresist, typically SU-8. Because heating and transmittance are not an issue in optical...
    16 KB (1,958 words) - 19:19, 15 May 2024
  • Thumbnail for Campenot chamber
    that a negative mold consisting of microchannels can be made using SU-8 photoresist on a silicon wafer arrayed at a height of 3 μm to restrict the cell...
    8 KB (941 words) - 16:41, 30 September 2024
  • thicknesses of both a-Si and SiO2 were allowed to vary. Polymers such as photoresist consist of long chains of molecules which do not form a crystallographic...
    31 KB (3,368 words) - 22:59, 29 June 2024
  • Thumbnail for X-ray lithography
    of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist...
    12 KB (1,623 words) - 17:49, 28 December 2022
  • bonding. SU-8 is a 3 component UV-sensitive negative photoresist based on epoxy resin, gamma butyrolactone and triaryl sulfonium salt. The SU-8 polymerizes...
    31 KB (3,833 words) - 09:38, 13 February 2024
  • Thumbnail for Photopolymer
    longer. Curable materials are widely used for medical, printing, and photoresist technologies. Changes in structural and chemical properties can be induced...
    33 KB (3,884 words) - 21:31, 30 August 2024
  • Thumbnail for Nanochemistry
    processing. In the case of negative photoresists, exposure to light causes the polymerization of the photoresist so the negative resist remains on the...
    38 KB (4,397 words) - 00:12, 10 June 2024
  • Thumbnail for Color filter array
    variants include CMY and CMYW matrices. Diazonaphthoquinone (DNQ)-novolac photoresist is one material used as the carrier for making color filters from color...
    23 KB (2,286 words) - 19:00, 23 September 2024