SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the...
14 KB (1,718 words) - 12:28, 6 September 2024
issue for high-resolution patterning Example: SU-8 (epoxy-based polymer), good adhesion), Kodak Photoresist (KPR) Modulation transfer function MTF (modulation...
29 KB (3,241 words) - 09:30, 11 August 2024
ultraviolet light source, like a mercury lamp, to expose a polymer photoresist, typically SU-8. Because heating and transmittance are not an issue in optical...
16 KB (1,958 words) - 19:19, 15 May 2024
Refractive index and extinction coefficient of thin film materials (section Example 2: 248 nm photoresist on silicon substrate (PR/Si-Sub))
thicknesses of both a-Si and SiO2 were allowed to vary. Polymers such as photoresist consist of long chains of molecules which do not form a crystallographic...
31 KB (3,368 words) - 22:59, 29 June 2024
that a negative mold consisting of microchannels can be made using SU-8 photoresist on a silicon wafer arrayed at a height of 3 μm to restrict the cell...
8 KB (941 words) - 16:41, 30 September 2024
of a thin film of photoresist. It uses X-rays to transfer a geometric pattern from a mask to a light-sensitive chemical photoresist, or simply "resist...
12 KB (1,623 words) - 17:49, 28 December 2022
Adhesive bonding of semiconductor wafers (section SU-8)
bonding. SU-8 is a 3 component UV-sensitive negative photoresist based on epoxy resin, gamma butyrolactone and triaryl sulfonium salt. The SU-8 polymerizes...
31 KB (3,833 words) - 09:38, 13 February 2024
Photopolymer (section Photoresists)
longer. Curable materials are widely used for medical, printing, and photoresist technologies. Changes in structural and chemical properties can be induced...
33 KB (3,884 words) - 21:31, 30 August 2024
Nanochemistry (section Photoresists)
processing. In the case of negative photoresists, exposure to light causes the polymerization of the photoresist so the negative resist remains on the...
38 KB (4,397 words) - 14:26, 30 October 2024
variants include CMY and CMYW matrices. Diazonaphthoquinone (DNQ)-novolac photoresist is one material used as the carrier for making color filters from color...
23 KB (2,286 words) - 00:08, 27 October 2024