• Thumbnail for Tuomo Suntola
    Tuomo Suntola (born 1943) is a Finnish physicist, inventor, and technology leader. He is best known for his pioneering research in materials science,...
    10 KB (1,173 words) - 13:24, 10 October 2023
  • (EL) displays after purchasing the development project, headed by Dr. Tuomo Suntola. The EL displays were manufactured using the atomic layer deposition...
    4 KB (546 words) - 10:59, 13 July 2024
  • (TFEL) at Instrumentarium Oy in Finland, Tuomo Suntola devised ALD as an advanced thin-film technology. Suntola named it atomic layer epitaxy (ALE) based...
    65 KB (7,388 words) - 23:29, 2 July 2024
  • Thumbnail for Millennium Technology Prize
    revolution"" (Press release). "2018 Millennium Technology Prize for Tuomo Suntola – Finnish physicist's innovation enables manufacture and development...
    20 KB (990 words) - 08:45, 9 February 2024
  • same year (patent published in 1976) by Dr. Tuomo Suntola at the Instrumentarium company, Finland. Dr. Suntola's purpose was to grow thin films of Zinc sulfide...
    5 KB (568 words) - 18:07, 5 May 2021
  • Aleskovsky and Stanislav Koltsov and in 1974 by the Finnish inventor Tuomo Suntola. Capital Asset Pricing Model (CAPM) is a popular model in finance for...
    96 KB (11,041 words) - 23:47, 6 July 2024
  • thin films one atomic layer at a time was developed and patented by Tuomo Suntola and co-workers in Finland. In another development, the synthesis and...
    45 KB (5,070 words) - 19:40, 23 June 2024
  • materials in a layer by layer fashion, was later independently developed by Tuomo Suntola under the name atomic layer epitaxy. "Валентин Борисович Алесковский...
    8 KB (696 words) - 05:03, 9 September 2022
  • thanks to the independent work of Valentin Borisovich Aleskovskii. and Tuomo Suntola, the first MLD experiments with organic molecules were not published...
    65 KB (8,533 words) - 12:02, 3 June 2024
  • Riikka L. (2014-12-01). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344...
    2 KB (223 words) - 20:33, 23 August 2023