• Thumbnail for Extreme ultraviolet lithography
    Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a new technology used in the semiconductor industry for manufacturing integrated circuits...
    116 KB (13,604 words) - 14:00, 4 July 2024
  • Thumbnail for Extreme ultraviolet
    the terms. The main uses of extreme ultraviolet radiation are photoelectron spectroscopy, solar imaging, and lithography. In air, EUV is the most highly...
    13 KB (1,518 words) - 00:56, 30 May 2024
  • Thumbnail for ASML Holding
    ASML Holding (redirect from ASM Lithography)
    semiconductor industry and the sole supplier in the world of extreme ultraviolet lithography (EUV) photolithography machines that are required to manufacture...
    40 KB (3,272 words) - 14:51, 26 June 2024
  • including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography (EUVL), and X-ray lithography. The wavelength of light...
    57 KB (6,379 words) - 23:49, 5 July 2024
  • Thumbnail for X-ray lithography
    generate secondary electrons as in the cases of extreme ultraviolet lithography and electron beam lithography. While the fine pattern definition is due principally...
    12 KB (1,623 words) - 17:49, 28 December 2022
  • Thumbnail for Ultraviolet
    wavelength bands in the UV spectrum. 13.5 nm: Extreme ultraviolet lithography 30–200 nm: Photoionization, ultraviolet photoelectron spectroscopy, standard integrated...
    114 KB (12,504 words) - 20:15, 27 June 2024
  • laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 7 nanometers in 2018. Extreme ultraviolet lithography machines...
    10 KB (1,103 words) - 16:18, 24 May 2024
  • Thumbnail for Electron-beam lithography
    from 0 to as high as 50 nm (see section New frontiers and extreme ultraviolet lithography). Hence, resist-substrate charging is not repeatable and is...
    38 KB (4,735 words) - 04:01, 12 May 2024
  • Nanolithography (category Lithography (microfabrication))
    set include multiphoton lithography, X-Ray lithography, light coupling nanolithography (LCM), and extreme ultraviolet lithography (EUVL). This last technique...
    16 KB (1,682 words) - 09:17, 28 May 2024
  • Thumbnail for Moore's law
    generation of chips. The cost of the tools, principally EUVL (Extreme ultraviolet lithography), used to manufacture chips doubles every 4 years. Rising manufacturing...
    109 KB (11,219 words) - 16:25, 5 July 2024