• Thumbnail for Optical proximity correction
    Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process...
    16 KB (1,849 words) - 23:46, 21 July 2024
  • to a few square micrometres of resist. Commercial full-chip optical proximity correction (OPC), using model forms, was first implemented by TMA (now a...
    13 KB (1,504 words) - 21:30, 14 June 2023
  • Thumbnail for Photomask
    Photomask (redirect from Optical mask)
    produce photomasks (Eventually this whole process was replaced by the optical pattern generator to produce the master image). At this point the master...
    20 KB (2,323 words) - 15:35, 24 August 2024
  • Thumbnail for Inverse lithography
    solution does not exist. In conventional approaches known as the optical proximity correction (OPC) a "target" shape is augmented with carefully tuned rectangles...
    2 KB (221 words) - 22:09, 10 November 2022
  • up OPC in Wiktionary, the free dictionary. OPC may refer to: Optical proximity correction Ordinary Portland cement Organic Photo Conductor, an element...
    3 KB (334 words) - 19:59, 4 May 2024
  • includes resolution enhancement technologies (RET), such as optical proximity correction (OPC) which corrects for the wave-like behavior of light when...
    5 KB (590 words) - 01:06, 30 July 2024
  • semiconductor industry. At the centre of the litigation was Optical proximity correction (OPC) software needed for lithography machines to print tiny...
    6 KB (623 words) - 14:03, 6 July 2024
  • increasing the quality of the final photomask. This also includes optical proximity correction (OPC) or inverse lithography technology (ILT) – the up-front...
    21 KB (2,403 words) - 19:05, 20 August 2024
  • gradually progressed to deep-UV immersion lithography using optical proximity correction, inverse lithography technology, off-axis illumination, phase-shift...
    10 KB (1,111 words) - 00:58, 10 January 2024
  • Use of 300 mm wafer size Use of KrF (248 nm) lithography with optical proximity correction 512 Mbit 1.8 V operation Derivative of earlier 110 nm and 100 nm...
    10 KB (875 words) - 06:26, 9 October 2024