Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical...

fabrication plants. ASM's technologies include atomic layer deposition, epitaxy, chemical vapor deposition and diffusion. The company was founded by Arthur...

interest in diffraction patterns by differentiating by phase. In atomic layer deposition, the substrate acts as an initial surface on which reagents can...

Essentially, MLD resembles the well established technique of atomic layer deposition (ALD) but, whereas ALD is limited to exclusively inorganic coatings...

Many growth methods rely on nucleation control such as atomic-layer epitaxy (atomic layer deposition). Nucleation can be modeled by characterizing surface...

Atomic layer epitaxy (ALE), more generally known as atomic layer deposition (ALD), is a specialized form of thin film growth (epitaxy) that typically...

created using atomic layer deposition (ALD) with unique physical, chemical, and electronic properties. For example, a rough oxide layer can be further...

reactions underpinning the thin film deposition technique that years later became known as atomic layer deposition. He was the rector of Leningrad Technological...

(2014-12-01). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344. doi:10...

materials science, developing the thin film growth technique called atomic layer deposition. Suntola was born in Tampere, Pirkanmaa, in 1943, during the Continuation...