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Summary
| Description | English: Obtained by 45 deg irradiation of polycarbonate (PC) with 8.3 MeV/u Xe ions at Uppsala University followed by selective etching in 5M NaOH with trace of surfactant 2A1 (DuPont). |
| Date | |
| Source | Own work |
| Author | Reimar Spohr] |
Licensing
I, the copyright holder of this work, hereby publish it under the following license:
This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license.
- You are free:
- to share – to copy, distribute and transmit the work
- to remix – to adapt the work
- Under the following conditions:
- attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
File history
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 21:30, 11 October 2011 | | 962 × 722 (607 KB) | Reimarspohr | mirrored image |
| 12:35, 10 October 2011 |  | 960 × 720 (593 KB) | Reimarspohr |
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